We present our progress in the fabrication and measurement of a transmission-based dielectric double-grating acceleration structure. The structure lends itself to simpler coupling to the accelerating mode in the waveguide with negligible group velocity dispersion efects, allowing for operation with ultra-short (fs) laser pulses. This document describes work being done at Sanfored Nanofabrication Facility to create a monolithic guided-wave structure with 800 nm period gratings separatedby a fixed subwavelength gap using standard optical lithographic techniques on a fused silica substrate. An SEM and other characterization tools were used to measure the fabrication deviations of the grating geometry and simulations were carried out in MATLAB and HFSS to study the effects of such deviations on the resulting accelerating gradient. Show Partial Abstract