Thin film applications are of great interest to the semiconductor industry due to the important role they play in cutting edge technology such as thin film solar cells. X-Ray Reflectivity (XRR) characterizes thin films in a non-destructive and efficient manner yet complications exist in extracting these characteristics from raw XRR data. This study developed and tested two different algorithms to extract quantity of layers and thickness information on the nanometer scale from XRR data. It was concluded that an algorithm involving a local averaging technique revealed this information clearly in Fourier space. Show Partial Abstract